Tantalum sputtering target
Commodity Tantalum supttering target
Standard£º ASTM B 708-98
Dimension: ¦µ(25-400)mm*(3-28)mm
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Tantalum sputtering target
Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets: Thickness 1mm up to 12.7mm x Width up to 600mm x Length
up to 2000mm
Purity: >=99.95% or 99.99%
Table 1: technology parameter
|
Grade |
3N, 3N5, 4N, with Ta 99.99%min |
|
Recrystallization |
95%min |
|
Grain size |
ASTM 4 or finer |
|
Surface finish |
16Rms max. or Ra 0.4 ( RMS64 or better) |
|
Flatness |
0.1mm or 0.15% max |
|
Tolerance |
+/-0.010" on all dimensions |
Table 1. Chemical composition:
|
Chemistry ppm |
|
Designation |
Chief component |
Impurities maxmium |
|
Ta |
Nb |
Fe |
Si |
Ni |
W |
Mo |
Ti |
|
O |
C |
H |
N |
|
Ta1 |
Remainder |
300 |
40 |
30 |
20 |
40 |
40 |
20 |
|
150 |
40 |
15 |
20 |
|
Ta2 |
Remainder |
800 |
100 |
100 |
50 |
200 |
200 |
50 |
|
200 |
100 |
15 |
100 |
|
TaNb3 |
Remainder |
£¼35000 |
100 |
100 |
50 |
200 |
200 |
50 |
|
200 |
100 |
15 |
100 |
|
TaNb20 |
Remainder |
170000-
230000 |
100 |
100 |
50 |
200 |
200 |
50 |
|
200 |
100 |
15 |
100 |
|
Ta2.5W |
Remainder |
400 |
50 |
30 |
20 |
30000 |
60 |
20 |
|
150 |
50 |
15 |
60 |
|
Ta10W |
Remainder |
400 |
50 |
30 |
20 |
110000 |
60 |
20 |
|
150 |
50 |
15 |
60 |
Special requirements to be agreed on by the supplier and buyer of negotiations